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Photomask

Masks are integral components in the
lithographic process of semiconductor
manufacturing. They contain transparent
substrate which covered patterned opaque
layer on it. This architecture used in
lithography to block resist exposure in
selected area and transfer circuit patterns
from mask to wafer for mass prodcution.

How we make BIM
  • Exposure by e-beam or laser beam

  • Post Exposure Bake

  • Development

  • CrOx/Cr Etching by dry/wet Etching Process

  • Photoresist Stripping
How we make APSM (Attenuated Phase Shifting Mask)
  • Exposure by e-beam or laser beam

  • Post Exposure Bake

  • Development

  • CrOx/Cr Etching by dry/wet Etching Process

  • Photoresist Stripping

  • PSM Layer Etching

  • 2nd PR Coating/Patterning

  • Cr & Pr Film Remove
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